IJS KOLOKVIJ,petek, 04. 04. 2014; ob 10.15 uri; Dr. André Anders

[Tanja Debevec]

V okviru "Izbranih poglavij iz nanoznanosti in nanotehnologij" vas vabimo na predavanje, ki bo v petek, 4. aprila 2014, ob 10:15, v predavalnici Mednarodne podiplomske šole Jožefa Stefana na Jamovi cesti 39 v Ljubljani. 

Napovednik predavanja najdete tudi na naslovu  <http://www.ijs.si/ijsw/Koledar_prireditev> http://www.ijs.si/ijsw/Koledar_prireditev.

~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~

Dr. André Anders

Lawrence Berkeley National Laboratory, Berkeley, ZDA 

 

 

Uvod v tehnike plazemskega nanašanja tankih plasti 

Obstaja veliko načinov za nanašanje tankih plasti in prevlek. V predavanju bom predstavil tehnike, ki temeljijo na uporabi plazme, tj. četrtem stanju snovi. Prednost plazemskih tehnik za nanašanje tankih plasti je v tem, da lahko lastnosti tankih plasti spreminjamo s številnimi procesnimi parametri kot so: moč na tarčah, tlak delovnega plina ter napetost na podlagah. Vse te količine lahko dovajamo v pulzih, kar omogoča dodaten parameter za spreminjanje lastnosti tankih plasti. Da bi to pokazal na sistematičen način, bom v kratkem uvodu predstavil osnove fizike plazme. Temu bosta sledila dva primera plazemskih tehnik za nanašanje tankih plasti: katodni lok in magnetronsko naprševanje. Pri slednji tehniki bom predstavil klasično magnetronsko naprševanje in novo nastajajočo tehnologijo, imenovano magnetronsko naprševanje pri visokih pulznih močeh. Uporaba plazemskih tehnik je široka, od trdih prevlek za orodja, materialov za sončne celice do biomedicinskih prevlek.

Predavanje bo v angleščini.

Lepo vabljeni!

 

 

*****

 

 

In the scope of "Selected chapters from nanosciences and nanotechnologies" we invite you to the lecture held on Friday, April 4th, 2014 at 10:15 AM in the Lecture Hall of the Jožef Stefan International Postgraduate School, Jamova 39, Ljubljana. 

To read the abstract click http://www.ijs.si/ijsw/Koledar_prireditev.

 

********************************************

Dr. André Anders

Lawrence Berkeley National Laboratory, Berkeley, ZDA

 

 

 

An Introduction to Plasma-Based Deposition of Thin Films

 

There are many ways of making thin films and coatings. In this introduction, the focus is on processes using plasma, the fourth state of matter. Plasma-based physical vapor deposition has the distinction that film properties can be tuned with a number of process parameters, including process power, process gas pressure, and bias voltage applied to the substrate to be coated. All parameters can be pulsed, which provides even more process options. To show this in a systematic manner, a very brief introduction is given on plasma and sheath, i.e. the plasma boundary. This is followed by two examples of plasma-based thin deposition techniques: cathodic arc and magnetron sputtering. For the latter, I will expand from conventional magnetron sputtering to an emerging technology called high power impulse magnetron sputtering. The applications of plasma-based techniques are broad, ranging from hard tool coatings, solar cell materials, to biomedical coatings.  

 

Cordially invited!

 

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://mailman.ijs.si/pipermail/kolokvij-ijs/attachments/20140331/8a4fb616/attachment.html>